Article ID Journal Published Year Pages File Type
5358902 Applied Surface Science 2011 7 Pages PDF
Abstract
▶ New iridium precursor for atomic layer deposition was tested. ▶ Effect of precursor on catalyst surface species, chemical state and characteristics. ▶ New precursor allows Ir deposition at lower T compared to conventional precursor.
Keywords
Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Preview
The effect of iridium precursor on oxide-supported iridium catalysts prepared by atomic layer deposition
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