Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5359306 | Applied Surface Science | 2011 | 4 Pages |
Abstract
Nickel (Ni) thin films were deposited on glass substrates in high vacuum and at room temperature with third-harmonic or 355-nm output from a nanosecond Nd:YAG laser. At low laser fluence of 1Â J/cm2, the deposition rate was about 0.0016Â nm/shot which increased linearly until 4Â J/cm2. Above 4Â J/cm2, the onset of phase explosion in the ablation abruptly increased the optical emission intensity from laser-produced Ni plume as well as thin-film deposition rate by about 6Ã. The phase explosion also shifted the size distribution and number density of Ni droplets on its thin-film surface. On the other hand, the surface structures of the ablated Ni targets were compared between the scan-mode and the fixed-mode ablations, which may suggest that droplets observed on the thin-film surface were caused by direct laser-induced splashing of molten Ni rather than vapour-to-cluster condensation during the plume propagation.
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Authors
W.O. Siew, S.S. Yapl, T.K. Yong, C.H. Nee, T.Y. Tou,