Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5359463 | Applied Surface Science | 2009 | 5 Pages |
Abstract
Pulsed laser deposition technique is used for deposition of tungsten-doped indium oxide films. The effect of film thickness on structural, optical and electrical properties was studied using X-ray diffraction (XRD), atomic force microscopy, UV-visible spectroscopy, and electrical measurements. X-ray diffraction study reveals that all the films are highly crystalline and oriented along (2Â 2Â 2) direction and the film crystallinity increases with increase in film thickness. Atomic force microscopy analysis shows that these films are very smooth with root mean square surface roughness of â¼1.0Â nm. Bandgap energy of the films depends on thickness and varies from 3.71Â eV to 3.94Â eV. It is observed that resistivity of the films decreases with thickness, while mobility increases.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
R.K. Gupta, K. Ghosh, P.K. Kahol,