Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5359634 | Applied Surface Science | 2015 | 6 Pages |
Abstract
Nitrogen-doped diamond-like carbon (N-DLC) films were synthesized by glow discharge plasma enhanced chemical vapor deposition (PECVD) using a hybrid ion beam system. The influence of nitrogen incorporation on the microstructure and electrochemical properties of N-DLC films was investigated by scanning probe microscopy, Raman spectroscopy, X-ray photoemission spectroscopy and cycle voltammetry. Regardless of the deposition parameters, the surface of all the deposited films is very smooth. Raman spectra show that ID/IG increases from 0.6 to 1.04 with the substrate bias voltage increases. XPS results identify that carbon is bonded with nitrogen and the substrate bias makes no distinct contribution to the N content in the films, even the N-DLC film at bias of â550Â V has the lowest N-O bonds concentration and the highest C-N bonds concentration. The film electrodes show the wide potential windows range over 4Â V, lower background currents in strong acid media. At the bias of â550Â V, the N-DLC film electrode not only exhibits the ÎEp at 209Â mV and Ipox/Ipred at 0.8778 in K3Fe(CN)6 solution, respectively, but also illustrates a nearly reversible electrode reaction. The mechanism of electroproperties is discussed in terms of the atomic bond structures and diffusion process.
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Authors
Kai Zhou, Peiling Ke, Xiaowei Li, Yousheng Zou, Aiying Wang,