Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5359886 | Applied Surface Science | 2014 | 6 Pages |
Abstract
Titanium (Ti) layers were deposited by direct current (DC) magnetron sputtering on commercial fluorine-doped tin oxide (FTO) glasses, followed by simultaneous oxidation and annealing treatment in a tubular furnace to prepare titanium dioxide (TiO2)/FTO bilayer films. Large and densely arranged grains were observed on all TiO2/FTO bilayer films. The presence of TiO2 tetragonal rutile phase in the TiO2/FTO bilayer films was confirmed by X-ray diffraction (XRD) analysis. The results of parameter optimization indicated that the TiO2/FTO bilayer film, which was formed by adopting a temperature of 400 °C and an oxygen flow rate of 15 sccm, had the optimal overall photoelectric property with a figure of merit of 2.30 Ã 10â2 Ωâ1, higher than 1.78 Ã 10â2 Ωâ1 for the FTO single-layer film. After coating a 500 nm-thick AZO layer by DC magnetron sputtering on this TiO2/FTO bilayer film, the figure of merit of the trilayer film achieved to a higher figure of merit of 3.12 Ã 10â2 Ωâ1, indicating further improvement of the overall photoelectric property. This work may provide a scientific basis and reference for improving overall photoelectric property of transparent conducting oxide (TCO) films.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Bao-jia Li, Li-jing Huang, Nai-fei Ren, Ming Zhou,