| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5359905 | Applied Surface Science | 2014 | 8 Pages |
Abstract
- Formation of an ultrathin C-S-H phase on a native oxide covered silicon wafer.
- Predominance of Si-O sites at the C-S-H/water interface.
- Can be used in future to model chemistry at cement/water interfaces.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Christoph Ebbert, Guido Grundmeier, Nadine Buitkamp, Alexander Kröger, Florian Messerschmidt, Peter Thissen,