Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5360041 | Applied Surface Science | 2013 | 6 Pages |
Abstract
⺠A new technique to form microscopic grid patterns of the ECM on a Si surface is presented. ⺠The technique uses cold atmospheric pressure plasmas with a metal stencil mask. ⺠Reactive oxygen species in the cold plasma are likely to remove exposed ECM. ⺠Neuronal model cells PC12 are shown to proliferate on patterned ECM grid layers on Si although neuronal network formation on patterned ECM is yet to be studied. ⺠Plasma overexposure can form ECM grid patterns narrower than the mask patterns.
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Authors
Ayumi Ando, Hidetaka Uno, Tsuneo Urisu, Satoshi Hamaguchi,