| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5360042 | Applied Surface Science | 2013 | 6 Pages |
Abstract
⺠CuO films were deposited on MgO (1 0 0) substrates by two PLD configurations to investigate the effect of growth background on film properties. ⺠Changing the substrate temperature was found to have a limited effect on the structural properties of the films grown in RF-plasma assisted background while it has a significant effect in the case of the standard gas background. ⺠The RF-plasma enhanced the layer-by-layer growth tendency making the CuO films highly textured in (1 1 1) direction, atomically smooth and chemically stoichiometric. ⺠Optoelectronic properties of best obtained CuO film found to be suitable for PV device application. ⺠The discussed results could be useful for better understanding the effect of PLD background control on CuO film quality.
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Authors
M. Kawwam, F.H. Alharbi, T. Kayed, A. Aldwayyan, A. Alyamani, N. Tabet, K. Lebbou,