Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5360203 | Applied Surface Science | 2009 | 7 Pages |
Abstract
Titanium films were deposited on glass substrates at room temperature by direct current (dc) magnetron sputtering at fixed Ar pressure of 1.7Â Pa and sputtering time of 4Â min with different sputtering power ranging from 100 to 300Â W. Atomic force microscopy (AFM) was used to study topographic characteristics of the films, including crystalline feature, grain size, clustering and roughening. The amorphous-like microstructure feature has been observed at 100-150Â W and the transition of crystal microstructure from amorphous-like to crystalline state occurs at 200Â W. The increase in grain size of Ti films with the sputtering power (from 200 to 300Â W) has been confirmed by AFM characterization. In addition, higher sputtering power (300Â W) leads to the transformation of crystal texture from globular-like to hexagonal type. The study has shown that higher sputtering power results in the non-linear increase in deposition rate of Ti films. Good correlativity between the surface roughness parameters including root mean square (RMS) roughness, surface mean height (Ra) and maximum peak to valley height (P-V) for evaluating the lateral feature of the films has been manifested. Surface roughness has an increasing trend at 100-250Â W, and then drops up to 300Â W.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Yongzhong Jin, Wei Wu, Li Li, Jian Chen, Jingyu Zhang, Youbing Zuo, Jun Fu,