| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5360220 | Applied Surface Science | 2010 | 4 Pages |
Abstract
Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting “smooth” surfaces and ion RF-sputter etching by high power has significantly modified the surface roughness with an increase of the light diffuse transmittance.
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Authors
S. Flickyngerova, J. Skriniarova, M. Netrvalova, J. Jr., I. Novotny, P. Sutta, V. Tvarozek,