Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5360251 | Applied Surface Science | 2013 | 4 Pages |
Abstract
⺠Amorphous-nanocrystalline silicon thin films were prepared by PECVD. ⺠Silicon nanocrystalls embeded in amorphous silicon matrix. ⺠The in-depth distribution of hydrogen atoms was estimated by TOF-ERDA. ⺠Non uniform distribution of hydrogen across the depth with maximum close to a-Si:H/a-nc-Si:H interface.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
D. Gracin, Z. SiketiÄ, K. JuraiÄ, M. Äeh,