Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5360425 | Applied Surface Science | 2013 | 6 Pages |
Abstract
⺠New method to control size and surface density of the Si agglomerates. ⺠We influence the dewetting by the deposition carbon layer. ⺠Thickness of carbon layer is controlled by scanning electron microscopy irradiation. ⺠We induce alternative dewetting mechanism for the case of strained silicon film.
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Authors
Å. Borowik, N. Chevalier, D. Mariolle, E. Martinez, F. Bertin, A. Chabli, J.-C. Barbé,