| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5360432 | Applied Surface Science | 2013 | 6 Pages |
Abstract
⺠Cu2O thin film were fabricated by electrodeposition KCl as doping agent. ⺠KCl-doped influence morphology of Cu2O thin film. ⺠KCl-doped influence resistivity, open-circuit voltage and conduction type. ⺠Annealing processing influence resistivity and open-circuit voltage. ⺠The forbidden band width of Cu2O thin film is 1.98 eV.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Xiaojiao Yu, Xinming Li, Gang Zheng, Yuchen Wei, Ama Zhang, Binghua Yao,