Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5361105 | Applied Surface Science | 2008 | 4 Pages |
Abstract
Ferromagnetic amorphous Fe-Co-Hf-N thin films with a gradient concentration of Hf doping were fabricated by rf reactive magnetron sputtering. The evaluated magnetic properties and high-frequency characteristics were sensitive to the doping contents. In this study, a new technology was used to deposit a series of Fe-Co-Hf-N thin films on which gradient concentration of Hf was present. By this new deposited technology, the films existed residual stress, and thus the stress-induced anisotropy field was enhanced. Therefore, the as-deposited films without postannealing exhibited larger anisotropy field (Hk) of 150 Oe. In addition, coercivity (HC) of less than 5 Oe in both easy and hard axes, and electrical resistivity (Ï) of 500 μΩ cm were obtained. The permeability measurement showed a permeability of around 100 at 3 GHz and a ferromagnetic resonance frequency (fFMR) in excess of 3 GHz. It is expected that this film should be promising for practical applications as a high-frequency ferromagnetic material.
Related Topics
Physical Sciences and Engineering
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Physical and Theoretical Chemistry
Authors
Cheng-Lun Kuo, Shandong Li, Jenq-Gong Duh,