| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5361467 | Applied Surface Science | 2012 | 7 Pages |
Abstract
⺠Utilizing ion irradiation and nanosphere lithography to induce local swelling on Si. ⺠Pattern height and curvature were tailored by the mask and irradiation parameters. ⺠Proximity exposure effect calculations to predict the radial ion fluence distribution. ⺠Good agreement between AFM profiles and ion fluence distributions. ⺠Surface profiles were predicted for several particle shapes, sizes, and ion energies.
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Authors
N. Nagy, Z. Zolnai, E. Fülöp, A. Deák, I. Bársony,