| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5361477 | Applied Surface Science | 2012 | 6 Pages |
ZnO/SiGe thin films were prepared by radio frequency magnetron sputtering. The effects of the ZnO layer and the annealing temperature on the structure, optical absorption and film-substrate cohesion properties of the films were investigated by XRD, SEM, UV-vis and coating adhesion automatic scratch tester. The results indicated that the additional ZnO layer and the annealing behavior could effectively improve the crystallinity of the SiGe films, and enhance the optical absorption intensity or range of the films. The film-substrate cohesion property test showed that critical loading Lc values of the ZnO/SiGe films were almost in accordance with those of the SiGe films when annealing temperature Tan is increased to 700 and 800 °C.
⺠ZnO/SiGe thin films were obtained by using radio frequency magnetron sputtering method and following annealing process at different temperatures. ⺠The XRD and SEM results showed that the additional ZnO layer and annealing behavior could effectively improve the crystallinity of the films. ⺠The UV-vis absorption spectra indicated that the optical absorption intensity or range of the films was enhanced. ⺠Film-substrate cohesion property test showed that critical loading Lc values of the ZnO/SiGe films were almost in accordance with those of the SiGe films when annealing temperature Tan is increased to 700 and 800 °C.
