| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5361479 | Applied Surface Science | 2012 | 10 Pages |
Abstract
⺠Different hydroxamic acids are suitable for the hydrophobization of TiAlN surfaces used in photo-patterning applications. ⺠The binding strength of the surfactant on the surface is dependent on the hydrogen and Ï-bonding interactions within the organic layer. ⺠Thermal desorption of selected HA species results in a 20% energy reduction compared to alkyl phosphates.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Maximilian Hemgesberg, Simon Schütz, Christine Müller, Matthias Schlörholz, Harald Latzel, Yu Sun, Christiane Ziegler, Werner R. Thiel,