| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5361503 | Applied Surface Science | 2012 | 8 Pages |
Abstract
⺠ZnO:Al films are prepared by reactively sputtering from rotatable dual metallic targets. ⺠High rate ZnO:Al films with good electrical and optical properties as well as proper surface structures are achieved at the transition mode region. ⺠Different working points or PEM intensities lead to different deposition rates, which are related with oxygen partial pressure as well as the sputtering properties to oxide and metal materials. ⺠The oxygen partial pressure plays a important role on different properties of reactively sputtered ZnO:Al films.
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Authors
H. Zhu, J. Hüpkes, E. Bunte, S.M. Huang,