Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5361549 | Applied Surface Science | 2008 | 5 Pages |
Abstract
The interaction of gallium with CeO2(1Â 1Â 1) layers was studied using standard and resonant photoelectron spectroscopy, by means of both a laboratory X-ray source and tunable synchrotron light. Firstly a 1.5-nm thick CeO2 film was grown on a Cu(1Â 1Â 1) substrate. Secondly Ga was deposited in six steps up to a thickness of 0.35Â nm, at room temperature. The interaction of gallium with the oxide layer induced partial CeO2 reduction, and gallium oxidation. The photoemission data suggest that a mixed Ga-Ce-O oxide was established similarly to the Sn-Ce-O case for Sn deposited on cerium oxide layers. As a consequence, gallium-induced weakening of Ce-O bonds provides a higher number of active sites on the surface that play a major role in its catalytic behaviour.
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Authors
TomáÅ¡ Skála, FrantiÅ¡ek Å utara, MiloÅ¡ Cabala, Michal Å koda, Kevin C. Prince, VladimÃr MatolÃn,