Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5361560 | Applied Surface Science | 2008 | 6 Pages |
Abstract
An electron conduction emitter of Al-AlN granular films was proposed for surface conduction electron emission device in this paper. The Al-AlN granular films with thickness of 30 nm were prepared between two co-planar electrodes with gap of 10 μm by magnetron sputtering. After electroforming the Al-AlN granular films, the films' structure could be recovered by applying the periodic device voltage (Vf). Stable and uniform electron emission was observed with turn-on voltage of 5.3 V and threshold voltage of 9 V. The emitter emission current (Ie) of 4.84 μA for 36 cells was obtained with the anode voltage of 2.5 kV and the device voltage of 12 V. In addition, Fowler-Nordheim plots for Ie-Vf properties showed that the electron emission mechanism should be field emission.
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Authors
H.F. Liang, C.L. Liu, Z.H. Liang, L.G. Meng,