| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5361700 | Applied Surface Science | 2012 | 6 Pages |
Abstract
⺠WTaN hard films were sputter deposited on silicon substrate using direct current magnetron sputtering technique. ⺠WTaN coatings were consisted of WTaN solid solution face centered cubic structure. ⺠Hardness of WTaN coatings reached maximum value of 38 GPa at the Ta content of 31 at.%. ⺠The adhesion strength of WTaN coatings to substrate varied in the range of 27-35 N.
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Authors
J.F. Yang, Y. Jiang, Z.G. Yuan, X.P. Wang, Q.F. Fang,