Layer-by-layer deposition of Ti-4,4â²-oxydianiline hybrid thin films

Article ID	Journal	Published Year	Pages	File Type
5361801	Applied Surface Science	2011	5 Pages	PDF

Abstract

âº A novel inorganic-organic hybrid material of the (-Ti-N-C6H4-O-C6H4-N-)n type is reported. âº The new hybrid material is grown layer-by-layer with an ALD-type process. âº Hybrid films deposited at 250-490Â Â°C are stable in atmospheric conditions. âº Films grown at higher temperatures are more stable than those grown at lower temperatures. âº The growth rate increases with increasing temperature.

Keywords

Atomic layer deposition Molecular layer deposition Inorganic–organic hybrid

Related Topics

Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry

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Layer-by-layer deposition of Ti-4,4â²-oxydianiline hybrid thin films

Authors

Anjali Sood, Pia Sundberg, Jari Malm, Maarit Karppinen,