Effect of negative substrate bias on the microstructure and mechanical properties of Ti-Si-N films deposited by a hybrid filtered cathodic arc and ion beam sputtering technique

► A new technique of hybrid MFCA and IBS was used to deposit TiSiN films. ► TiSiN superhard films were synthesized without intentional heating system. ► Negative bias had a wide influence on structure and properties of TiSiN films. ► 100 V negative bias was the optimal condition. ► Severe oxidation occurred in films deposited under 200 V and 300 V negative bias.