| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5362483 | Applied Surface Science | 2012 | 4 Pages |
Abstract
⺠Proton beam writing and UV lithography are used to expose AR-P 3250 resist. ⺠The processing conditions of AR-P 3250 resist have been optimized. ⺠Smooth and tall resist structures are demonstrated in AR-P 3250. ⺠These structures have been successfully transferred into high quality Ni moulds. ⺠Potential application can be found in nanoimprint lithography.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
P. Malar, Zhao Jianhong, J.A. van Kan,