| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5362858 | Applied Surface Science | 2011 | 4 Pages |
Abstract
⺠The waveguide was formed by 550 keV O ion followed by 250 keV O ion implantation. ⺠A nearly homogeneous damage layer was formed in the annealed waveguide. ⺠A homogeneous near-field intensity profile was obtained from the waveguide. ⺠The estimated propagation loss is about 0.5 dB/cm.
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Authors
S.-M. Zhang, K.-M. Wang, X.-H. Liu, X.-B. Ming,