| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5362916 | Applied Surface Science | 2011 | 6 Pages |
Abstract
⺠W/Si multilayers of periods ranging from 1.7 nm to 9.6 nm have been examined for changes in structure with period thickness. ⺠Loss of Si due to re-sputtering during W deposition has been estimated. ⺠Minimum thickness of continuous W layer has been estimated. ⺠Minimum period thickness possible to deposit has been estimated. ⺠Cause of interface asymmetry has been found out.
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Authors
S.K. Rai, Arijeet Das, A.K. Srivastava, G.S. Lodha, Rajnish Dhawan,