Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5362918 | Applied Surface Science | 2011 | 6 Pages |
Abstract
⺠Si-TiO2 target has been simply prepared and the corresponding film was deposited on quartz glass substrates by electron beam evaporation. ⺠It can be demonstrated the annealing temperature had significant effect on the structure, phase transition temperature and surface morphology of Si-TiO2 thin films. ⺠The Si-TiO2 films exhibit better photocatalytic efficiency owing to the reduction of the photo-generated electron and holes recombination rate under illumination.
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Authors
Zhongdan Lu, Xiaohong Jiang, Bing Zhou, Xiaodong Wu, Lude Lu,