Article ID Journal Published Year Pages File Type
5362940 Applied Surface Science 2011 5 Pages PDF
Abstract
► The atom diffusion is accelerated by the electric field. ► The acceleration is enhanced with an increment of annealing temperature. ► It is resulted from the increase of the mobility of vacancies and atoms.
Keywords
Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Preview
Effects of electric field annealing on the interface diffusion of Cu/Ta/Si stacks
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