Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5362950 | Applied Surface Science | 2011 | 7 Pages |
We present in this paper several results concerning the preparation by means of electrolysis and characterization of Co-Ni-Mo thin films. Co-Ni-Mo thin films with different molybdenum content in the range 0-25Â at% Mo were prepared from a complex solution containing ions of Co, Ni and Mo, using galvanostatic control, on aluminum substrates. The effects of applied current density on the morphology, magnetic, magnetoresistance, and optical properties of the electrodeposited Co-Ni-Mo films were investigated. The applied current density significantly influenced the film composition and their magnetic properties. The increase of molybdenum content in Co-Ni films (up to 25Â at% Mo) enhances the resistivity, but it reduces the magnetoresistance effect. We report the first observation of magnetoresistance as high as 8% in Co-Ni-Mo thin films.
⺠Co-Ni-Mo thin films were prepared by electrodeposition onto Al substrate. ⺠The applied current density significantly influenced the film composition and their magnetic properties. ⺠The coercivity varied in the range 16.5-29 kA/m depending on the molybdenum content (cMo) in the films. ⺠We report the first observation of magnetoresistance as high as 8% in Co-Ni-Mo thin films.