| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5363085 | Applied Surface Science | 2013 | 7 Pages |
Abstract
⺠Deposition rate of the buffer layer governs the substrate topography. ⺠Buffer layer topography influences the catalyst rearrangement. ⺠A higher deposition rate makes the substrate rougher. ⺠Rougher substrate grows the aligned, small diameter CNTs with greater height. ⺠Slow deposition rate samples show the opposite trend.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Shashikant P. Patole, Jae-Hun Jeong, Seong Man Yu, Ha-Jin Kim, Jae-Hee Han, In-Taek Han, Ji-Beom Yoo,