Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5363193 | Applied Surface Science | 2008 | 5 Pages |
Abstract
The surface of lactose particles was modified by a plasma-enhanced chemical vapor deposition process to improve the flow behavior of the powder. For this, the particulates were treated in a plasma down stream reactor which provides a short (50Â ms) and homogeneous exposure to the capacitively coupled RF discharge. The organosilicon monomer hexamethyldisiloxane (HMDSO) was used as a precursor for the formation of SiOx which is deposited on the substrate particle surface. For varying process gas mixtures (O2/Ar/HMDSO) and RF power applied, the amount of the deposited material was determined gravimetrically after dissolution of the lactose substrate particles and the chemical composition of the accumulated deposition material was investigated by means of attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy. The concentration of the deposited SiOx relating to the substrate material was found to be in the range of 0.1Â wt.%. Based on the ATR-FTIR analysis, the inorganic, i.e. oxidic SiOx fraction of the obtained deposits was shown to be controllable by varying the process parameters, whilst a relatively large amount of organic structures must be considered.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Adrian Spillmann, Axel Sonnenfeld, Philipp Rudolf von Rohr,