| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5363368 | Applied Surface Science | 2011 | 4 Pages |
Abstract
- Different surface morphology are obtained in different alkaline fluoride solutions.
- No Si-F bond exists, Fâ and CO32â ions accelerate the condensation of Si-OH groups.
- Bare silicon and silicon oxide coexist at the wafer surface during etching process.
- Silicon oxides determine surface morphology in alkaline fluoride solution.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Qingmei Chu, Xiang Liu, Pengxiang Zhang, Yongnian Dai,