| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5363391 | Applied Surface Science | 2011 | 4 Pages |
Abstract
⺠Direct current magnetron sputtering was adapted to prepare the 600 nm ITO films under different substrate temperatures. ⺠The mean infrared emissivity was measured in the heat-treatment process of heating and cooling from room temperature to 350 °C. ⺠Effect of the heat treatment on the infrared emissivity of indium tin oxide (ITO) films was investigated in detail. ⺠The emissivities of all films are below 0.3 in the whole heat treatment process.
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Authors
Kewei Sun, Wancheng Zhou, Xiufeng Tang, Zhibin Huang, Fa Lou, Dongmei Zhu,