Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5363802 | Applied Surface Science | 2007 | 4 Pages |
Abstract
We present a fabrication procedure that can form large-scale periodic silicon nanopillar arrays for 2D nanomold which determines the feature size of nanoimprint lithography, using modified nanosphere lithography. The size of silicon nanopillars can be easily controlled by an etching and oxidation process. The period and density of nanopillar arrays are determined by the initial diameter of polystyrene (PS) spheres. In our experiment, the smallest nanopillar has a full width half maximum (FWHM) of approximately 50Â nm, and the density of silicon pillar is â¼109/cm2. Using this approach, it is possible to fabricate 2D nanoimprint lithography mask with 50Â nm resolution.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Wei Li, Ling Xu, Wei-Ming Zhao, Ping Sun, Xin-Fan Huang, Kun-Ji Chen,