Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5363867 | Applied Surface Science | 2013 | 6 Pages |
Abstract
⺠Phosphorus can be removed to less than 0.07 Ã 10â4 wt.% by electron beam melting. ⺠The phosphorus content decreases rapidly at first and then tends to level out. ⺠Phosphorus evaporation in the melt free surface follows the first order kinetics. ⺠The mass transfer coefficients of phosphorus in silicon are calculated and discussed. ⺠The removal of phosphorus is controlled by both diffusion and evaporation.
Related Topics
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Authors
Shuang Shi, Wei Dong, Xu Peng, Dachuan Jiang, Yi Tan,