Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5363919 | Applied Surface Science | 2008 | 6 Pages |
Abstract
Nitrogen-doped titanium dioxide (TiO2âxNx) thin films have been prepared by pulse laser deposition on quartz glass substrates by ablated titanium dioxide (rutile) target in nitrogen atmosphere. The x value (nitrogen concentration) is 0.567 as determined by X-ray photoelectron spectroscopy measurements. UV-vis spectroscopy measurements revealed two characteristic deep levels located at 1.0 and 2.5Â eV below the conduction band. The 1.0Â eV level is attributable to the O vacancy state and the 2.5Â eV level is introduced by N doping, which contributes to narrowing the band-gap by mixing with the O2p valence band. The enhanced degradation efficiency in a broad visible-light range was observed from the degradation of methylene blue and methylene orange by the TiO2âxNx film.
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Authors
Lei Zhao, Qing Jiang, Jianshe Lian,