Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5364081 | Applied Surface Science | 2009 | 5 Pages |
Abstract
Uniform amorphous tungsten cone arrays in high density were fabricated by Ar+ reduction etching of WO3 nanowire film. The etching process was performed in the analysis chamber of an X-ray photoelectron spectroscopy (XPS) system. SEM and TEM results revealed that the tip radius of the etched cones was 10Â nm, and the cones were amorphous with a high aspect ratio of over 250. XPS analysis proved the cones to be metallic tungsten. In the aspect of field-emission property, the tungsten cone arrays had a lower turn-on field of 3Â MVÂ mâ1 compared with 5Â MVÂ mâ1 of the as-grown original WO3 nanowire film.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Fang Yan Xie, Li Gong, Xiao Liu, Jian Chen, Wei Guang Xie, Wei Hong Zhang, Shang Hui Chen,