| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5364298 | Applied Surface Science | 2007 | 5 Pages |
Abstract
Evolution of Si (1Â 0Â 0) surface under 100Â keV Ar+ ion irradiation at oblique incidence has been studied. The dynamics of surface erosion by ion beam is investigated using detailed analysis of atomic force microscopy (AFM) measurements. During an early stage of sputtering, formation of almost uniformly distributed nano-dots occurs on Si surface. However, the late stage morphology is characterized by self-organization of surface into a regular ripple pattern. Existing theories of ripple formation have been invoked to provide an insight into surface rippling.
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Authors
Yashpal S. Katharria, Sandeep Kumar, A. Tarun Sharma, Dinakar Kanjilal,