| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5364332 | Applied Surface Science | 2011 | 5 Pages |
Abstract
ⶠThe CW laser irradiation of amorphous silicon thin films has been modeled. ⶠThe optical properties of thin films are sensitive to film thickness due to the interference effects. ⶠPower densities to reach the melting, crystallization and ablation thresholds are determined. ⶠHeating the substrate during the laser process and low scan speeds allow to reduce significantly the threshold power densities.
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Z. Said-Bacar, Y. Leroy, F. Antoni, A. Slaoui, E. Fogarassy,