| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5364343 | Applied Surface Science | 2011 | 6 Pages |
Abstract
ⶠIn this paper we studied the effect of RF plasma on a-CNx films deposition. ⶠNitrogen plasma resulted in better thickness, quality and Nitrogen uptake of films. ⶠThe OES evidenced a reactivity enhancement of Nitrogen molecules in the RF plasma. ⶠThe electrical resistivity is higher, due to a greater number of C-N bond formation.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
E. Cappelli, S. Orlando, D.M. Trucchi, A. Bellucci, V. Valentini, A. Mezzi, S. Kaciulis,