Article ID Journal Published Year Pages File Type
5364780 Applied Surface Science 2010 6 Pages PDF
Abstract

The effect of sputtering anisotropic ejection on the optical properties and internal stress of niobium pentoxide (Nb2O5) films prepared by ion-beam sputtering deposition (IBSD) was investigated experimentally. Thin films were deposited on unheated BK7 glass substrates and silicon wafers at different ejection angles surrounding a metal target. The ejection angles varied from 0° to 75° in increments of 15° for each substrate. It was found that the optical constants of the Nb2O5 films were significantly influenced by the sputtering ejection angle. The surface roughness and residual stress in the Nb2O5 thin films were also found to vary with the ejection angle. In this work, Nb2O5 films had a higher refractive index, lower absorption, lower stress and lower roughness when films deposited at an ejection angle of 30°.

Related Topics
Physical Sciences and Engineering Chemistry Physical and Theoretical Chemistry
Authors
,