| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5366149 | Applied Surface Science | 2008 | 6 Pages |
Abstract
X-ray reflectivity analyses were performed in the Si/WTi (7Â nm)/NiFe (30Â nm)/FeMn (13Â nm)/NiFe (10Â nm)/WTi (7Â nm) exchange-biased system prepared by magnetron sputtering under three different argon working pressures. Layer-by-layer analyses were realized in order to obtain the interfacial roughness parameters quantitatively. For a fixed argon pressure, the root-mean-square roughness (including the atomic grading) of the upper (FeMn/NiFe) interface are greater than that for the lower one in all studied samples. Argon working pressure also has severe influence over the NiFe/FeMn interfaces, being more pronounced at the upper interfaces.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
V.P. Nascimento, E.C. Passamani, A.D. Alvarenga, A. Biondo, F. Pelegrini, E. Baggio Saitovitch,