Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5366306 | Applied Surface Science | 2006 | 4 Pages |
Abstract
We report here on changes in magnetism and microstructure when implanting, at 92 or 300 K, up to 5 Ã 1015 Au26+-ions cmâ2 of 350 MeV into natFe(45 nm)/57Fe(20 nm)/Si trilayers. This choice of ions and energy allowed to test the irradiation effects in the regime of pure electronic stopping. The samples were analysed before and after irradiation by Rutherford back-scattering spectroscopy, X-ray diffraction, conversion electron Mössbauer spectroscopy, and magneto-optical Kerr effect. Up to 1 Ã 1015 ions cmâ2, there was interface broadening at a mixing rate of ÎÏ2/Φ = 55(5) nm4, followed by full Fe-Si inter-diffusion. The Mössbauer spectra revealed fractions of α-Fe and amorphous ferromagnetic and paramagnetic iron silicides, but no crystalline Fe-Si phase. The magnetic remanence in the as-deposited Fe-layer showed small components of uniaxial and four-fold magnetization. For increasing ion fluence, the component with four-fold symmetry grew at the expense of the uniaxial component. For the highest fluences, an isotropic magnetization was found.
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Physical and Theoretical Chemistry
Authors
V. Milinovic, K.P. Lieb, P.K. Sahoo, P. Schaaf, K. Zhang, S. Klaumünzer, M. Weisheit,