Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5366307 | Applied Surface Science | 2006 | 4 Pages |
Abstract
The difference in the response of the two sample types to post deposition thermal treatment can be tracked back to the de-wetting behavior of Cu on the different substrates. Void formation is observed at the Cu-C interface in the case of plasma treatment but not for samples with a Mo-interlayer.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
C. Eisenmenger-Sittner, C. Schrank, E. Neubauer, E. Eiper, J. Keckes,