| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5366798 | Applied Surface Science | 2011 | 8 Pages |
Abstract
⺠TiO2 films were deposited by DC magnetron sputtering at different substrate bias voltages. ⺠The leakage current density decreased with the substrate bias voltage. ⺠Conduction mechanisms in TiO2 films were Schottky effect and Fowler-Nordheim effect. ⺠Dielectric constant increased with the substrate bias voltage. ⺠Optical band decreased with the increase of substrate bias voltage.
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Authors
M. Chandra Sekhar, P. Kondaiah, S.V. Jagadeesh Chandra, G. Mohan Rao, S. Uthanna,