| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5367096 | Applied Surface Science | 2007 | 5 Pages |
Abstract
Tantalum nitride films were deposited on silicon wafer and steel substrates by cathodic vacuum arc in N2/Ar gas mixtures. The chemical composition, crystalline microstructure and morphology of the films were investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM), respectively. According to the results, film composition and microstructure depends strongly on the N2 partial pressure and the applied negative bias (Vs).
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Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Erwu Niu, Li Li, Guohua Lv, Wenran Feng, Huan Chen, Songhua Fan, Size Yang, Xuanzong Yang,