Corrosion behavior of sputtered Cr-Si-Ni and Cr-Si-Ni-Al resistive films in 0.1Â M NaOH

The corrosion behavior of magnetron sputtered Cr-Si-Ni and Cr-Si-Ni-Al resistive films had been investigated by means of the relative resistance change (ΔR/R), polarization measurements, AES, and SEM in 0.1 M NaOH solution at 25 °C and 50 °C, which simulated an alkaline environment. The results revealed that both the annealed Cr-Si-Ni and Cr-Si-Ni-Al films in Ar ambient exhibited good corrosion resistance and long-term reliability in 0.1 M NaOH solution at 25 °C, due to the formation of a protective oxide layer on the surface of two types of the films during corrosion. However, the corrosion properties of two types of the films became degraded rapidly with the solution temperature at 50 °C. The studies showed that the pro-formation of a protective oxide layer on the surface of two types of the films by annealing in air had an enhancing effect on the corrosion properties of the films in 0.1 M NaOH solution at 50 °C, and that Cr-Si-Ni-Al films by annealing in air had more improving effect on the corrosion resistance and long-term reliability than Cr-Si-Ni films.