| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 5367219 | Applied Surface Science | 2006 | 5 Pages |
Abstract
A composition spread metal thin film fabrication technique based on ion beam sputter deposition method was developed. The technique enables us to fabricate any desired part or a complete binary/ternary composition spread metal thin films onto a single substrate by sequentially sputtering different target materials. Composition spread metal thin films can be deposited directly on a dielectric film in patterned electrode shape for C-V and I-V measurements. The system could be especially useful in the search for new multi-component metal gate materials.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
P. Ahmet, T. Nagata, D. Kukuruznyak, S. Yagyu, Y. Wakayama, M. Yoshitake, T. Chikyow,