Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5367461 | Applied Surface Science | 2007 | 4 Pages |
Abstract
Band bending and band alignment at HfO2/SiO2/Si and HfO2/Hf/SiO2/Si interfaces were investigated using X-ray photoelectron spectroscopy. After Hf-metal pre-deposition, a 0.55Â eV band bending in Si and a 1.80Â eV binding energy decrease for Hf 4f and O 1s of HfO2 were observed. This was attributed to the introduction of negative space charges at interface by Hf pre-deposition. Band bending decrease and synchronous binding energy increases of O 1s and Hf 4f for HfO2 were observed during initial Ar+ sputtering of the Hf pre-deposited sample. This was interpreted through the neutralization of negative space charges by sputtering-induced oxygen vacancies.
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Authors
Weijie Song, Michiko Yoshitake, Ruiqin Tan, Isao Kojima,