Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
5367522 | Applied Surface Science | 2009 | 5 Pages |
Nanostructured deposits of TiO2 were grown on Si (1Â 0Â 0) substrates by laser ablating a TiO2 sintered target in vacuum or in oxygen using a Ti:sapphire laser delivering 80Â fs pulses. The effect of the laser irradiation wavelength on the obtained nanostructures, was investigated using 800, 400 and 266Â nm at different substrate temperatures and pressures of oxygen. The composition of the deposits was characterized using X-ray photoelectron spectroscopy (XPS) and the surface morphology was studied by environmental scanning electron microscopy (ESEM) and atomic force microscopy (AFM). Deposits are absent of microscopic droplets in all conditions explored. The best deposits, constituted by nanoparticles of an average diameter of 30Â nm with a narrow size distribution, were obtained at the shorter laser wavelength of 266Â nm under vacuum at substrate room temperature.